It was developed for environment and safety of user with very low global warming potential which recognized to avoid the depletion of Ozone.
It can be used in cooling of semiconductor tester, dry etcher, CVD and stepper and other processes.
It can be used in CMP(chemical mechanical polishing) process. This product can be conducted for steady surface conditioning of pad and play a role of distributing slurry overall on pad.
Manufacturing diamond coating with friction-resistance
Providing stable performance
Minimize defect and scratch so it can be suitable for micro-fabrication process
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